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Sputtering
Sputtering targets for Optical devices
Product Lineup
| Product name | Oxygen-deficient niobium pentoxide (Nb2O5) target | Oxygen-deficient titanium oxide (TiO2) target |
|---|---|---|
| Specific resistance (Ω・cm) | <0.01 *DC sputtering is possible | <0.1 *DC sputtering is possible |
| Density ratio (%) | 99≦ | |
| Product name | Polycrystalline silicon (Si) target | |
|---|---|---|
| structure | Polycrystalline | |
| Specific resistance (Ω・cm) |
Low resistance type | ≦0.02 |
| High resistance type | 1～3 | |
| Product name | Aluminum (Al) target | Titanium (Ti) target |
|---|---|---|
| Material | Aluminum (Al) | Titanium (Ti) |
| purity(%) | 99.9995 Purity 5N5 | 99.995 Purity 4N5 |
| Product name | Single crystal silicon (Si) target |
|---|---|
| structure | Single crystal |
| Specific resistance (Ω・cm) | ≦0.02 |
| Size (mm) | Various shapes available |
| Product name | Niobium (Nb) target | Chromium (Cr) target |
|---|---|---|
| purity(%) | 99.9 | |
| Size (mm) | Various shapes available | |
| Product name | Silicon carbide (SixC) target |
|---|---|
| purity(%) | ≧99 |
| Specific resistance (Ω・cm) | ≦0.1 |
Product information
Optical Semiconductor
