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Sputtering
Sputtering targets for Optical devices
Optical film targets that achieve high productivity and high reliability.
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- Product name
- Polycrystalline silicon (Si) target
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- Features
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- The special shape processing technology realizes low arcing characteristics, high productivity and excellent long life characteristics.
- A high bonding rate with the backing plate ensures stable cooling efficiency.
Specifications
| Product name | Polycrystalline silicon (Si) target | |
|---|---|---|
| structure | Polycrystalline | |
| Specific resistance (Ω・cm) | Low resistance type | ≦0.02 |
| High resistance type | 1～3 | |
For forming low refractive index films
caution
Note on the characteristic data given - Data on the characteristics of the products described in this page based on the results of evaluations carried out by the company. This does not guarantee that the characteristics of the product conform with your usage environment. Before use, review the usage conditions based on evaluation data obtained from the equipment and substrates actually used.
Product information
Optical Semiconductor
