Sputtering

Sputtering targets for Optical devices

Optical film targets that achieve high productivity and high reliability.

Product name

Oxygen-deficient niobium pentoxide (Nb₂O₅) target
Features
- By reducing the resistance of the oxide target, high-rate sputtering (approximately 2.5 times higher than oxygen reactive sputtering) is achieved with DC sputtering.
- Our unique hot pressing technology allows us to create homogeneous, high-density targets.
- A high bonding rate with the backing plate ensures stable cooling efficiency.

Specifications

Product name	Oxygen-deficient niobium pentoxide (Nb₂O₅) target
Specific resistance (Ω・cm)	<0.01 *DC sputtering is possible
Density ratio (%)	99≦

Sputtering power supply: DC 5.1W/cm ²
Target size: φ50mm
T/S distance: 80mm
Process gas: Ar + O ₂ = 100 sccm
Gas pressure: 0.24Pa
Circuit board: B270 (Schott)
Ultimate vacuum pressure: ~10^-5 Pa

Results

2. Oxygen partial pressure dependency test

Test conditions

Results

*Refractive index n=2.3 or more at oxygen partial pressure of 1.5% or more (at 550 nm) T

*Extinction coefficient k≦5x10-3 or less at oxygen partial pressure of 3.0% or more

caution

Note on the characteristic data given - Data on the characteristics of the products described in this page based on the results of evaluations carried out by the company. This does not guarantee that the characteristics of the product conform with your usage environment. Before use, review the usage conditions based on evaluation data obtained from the equipment and substrates actually used.

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