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Sputtering
Sputtering targets for Optical devices
Optical film targets that achieve high productivity and high reliability.
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- Product name
- Titanium (Ti) target
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- Features
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- In addition to the standard backing plate type, we also offer an integrated type that is compatible with high-power sputtering.
- A high bonding rate with the backing plate ensures stable cooling efficiency.
Specifications
| Product name | Titanium (Ti) target |
|---|---|
| Material | Titanium (Ti) |
| purity(%) | 99.995 Purity 4N5 |
Formation of TiO2 films such as car side mirrors and photocatalytic films
1. Standard values for impurities
Test conditions
Test method: A = Thermal conductivity method
B = Infrared absorption method
C = glow discharge mass spectrometry (GDMS)
Results
| Standard values for impurities | Product name | Titanium (Ti) target | |
|---|---|---|---|
| Element (ppm) | Maximum | Test Method | |
| N | ≦50.00 | A | |
| O | ≦450.00 | B | |
| Ag | ≦1.00 | C | |
| Al | ≦8.00 | ||
| B | ≦1.00 | ||
| Ca | ≦1.00 | ||
| Cr | ≦10.00 | ||
| Cu | ≦2.00 | ||
| Fe | ≦20.00 | ||
| Ga | ≦1.00 | ||
| K | ≦1.00 | ||
| Li | ≦1.00 | ||
| Mg | ≦1.00 | ||
| Mo | ≦2.00 | ||
| Na | ≦1.00 | ||
| Ni | ≦2.00 | ||
| S | ≦5.00 | ||
| Sn | ≦2.00 | ||
| Zn | ≦1.00 | ||
| U (ppb) | ≦1.00 | ||
| Th(ppb) | ≦1.00 | ||
caution
Note on the characteristic data given - Data on the characteristics of the products described in this page based on the results of evaluations carried out by the company. This does not guarantee that the characteristics of the product conform with your usage environment. Before use, review the usage conditions based on evaluation data obtained from the equipment and substrates actually used.
Product information
Optical Semiconductor
