Sputtering

Sputtering targets for optical disc media

Various targets used to form each functional layer of optical disc media.

  • Product name
    Oxide Target
  • Features
    • As a supplier of magneto-optical recording materials such as phase change optical disks, we have accumulated know-how and a proven track record over many years, and our unique hot pressing technology allows us to create homogeneous, high-density targets.
    • DC sputtering allows for high sputtering rates with NbOx targets (approximately 2.5 times higher than reactive sputtering) and TiO2targets (approximately twice as high as reactive sputtering).
    • A high bonding rate with the backing plate ensures stable cooling efficiency.

Product Lineup

Specifications

Product name Oxide Target
Material Oxygen-deficient niobium pentoxide (Nb2O5) target Oxygen-deficient titanium oxide (TiO2) target
Specific resistance (Ω・cm) <0.01 *DC sputtering is possible <0.1 *DC sputtering is possible
Density ratio (%) 99≦ 99≦
Size (mm) φ149/φ200 φ149/φ200
*Please contact us if you require other sizes.

Application Example

Barrier film, dielectric film

Technical Data

1. Deposition rate test of oxygen-deficient niobium pentoxide (Nb2O5) target

Test conditions

Sputtering power supply: DC 5.1W/cm 2
Target size: φ50mm
T/S distance: 80mm
Process gas: Ar + O 2 = 100 sccm
Gas pressure: 0.24Pa
Circuit board: B270 (Schott)
Ultimate vacuum pressure: ~10-5 Pa

Results
graph_04.gif

2. Deposition rate test of oxygen-deficient niobium pentoxide (Nb2O5) target

Test conditions

Sputtering power supply: DC 5.1W/cm 2
Target size: φ50mm
T/S distance: 80mm
Process gas: Ar + O 2 = 100 sccm
Gas pressure: 0.24Pa
Circuit board: B270 (Schott)
Ultimate vacuum pressure: ~10-5 Pa

Results
graph_05.gif
  • *Refractive index n=2.3 or more at oxygen partial pressure of 1.5% or more (at 550 nm)
graph_06.gif
  • *Extinction coefficient k≦ 5x10-3 or less at an oxygen partial pressure of 3.0% or more

3. Film formation rate test of oxygen-deficient titanium oxide (TiO2) target

Test conditions

Sputtering power supply: DC 5.1W/cm 2
Target size: φ50mm
T/S distance: 80mm
Process gas: Ar + O 2 = 100 sccm
Gas pressure: 0.24Pa
Circuit board: B270 (Schott)
Ultimate vacuum pressure: ~10-5 Pa

Results
graph_01.gif

4. Oxygen partial pressure dependence test of oxygen-deficient titanium oxide (TiO2) target

Test Piece Condition

Sputtering power supply: DC 5.1W/cm 2
Target size: φ50mm
T/S distance: 80mm
Process gas: Ar + O 2 = 100 sccm
Gas pressure: 0.24Pa
Circuit board: B270 (Schott)
Ultimate vacuum pressure: ~10-5 Pa

Results
graph_02.gif
  • *Refractive index n=2.3 or more at oxygen partial pressure of 1.5% or more (at 550 nm)
graph_03.gif
  • *Extinction coefficient k≦ 5x10-3 or less at an oxygen partial pressure of 3.0% or more

caution

Note on the characteristic data given - Data on the characteristics of the products described in this page based on the results of evaluations carried out by the company. This does not guarantee that the characteristics of the product conform with your usage environment. Before use, review the usage conditions based on evaluation data obtained from the equipment and substrates actually used.

Product Lineup

Product information

Optical Semiconductor

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